Title :
Increased Light Extraction From Vertical GaN Light-Emitting Diodes With Ordered, Cone-Shaped Deep-Pillar Nanostructures
Author :
An, Ho-Myoung ; Sim, Jae In ; Shin, Ki Seob ; Sung, Yun Mo ; Kim, Tae Geun
Author_Institution :
Sch. of Electr. Eng., Korea Univ., Seoul, South Korea
fDate :
7/1/2012 12:00:00 AM
Abstract :
In this paper, improved light extraction using cone-shaped deep-pillar nanostructures is demonstrated on the Honeycomb-type vertical GaN light-emitting diodes (VLEDs). In order to produce ordered, cone-shaped deep-pillar patterns on the surface of an n-type GaN, double-layered polystyrene (PS) nanospheres of 500-nm size were coated onto the n-GaN layer by a simple spin-coating. Then, immediately after the O2 plasma ashing for double-layered PS beads, the Ni metal was deposited and lifted off to form a hard mask for deep pillar etching. Then, the three VLEDs-the reference VLED with no patterns and the two VLEDs with ordered, cone-shaped pillar patterns of 1.0 and 1.5 μm depth on the n-type GaN surface-were prepared for comparison. As a result, the output power for the proposed VLEDs with 1.0- and 1.5-μm-deep cone-shaped patterns has been increased by 200% and 214%, respectively, at 350 mA as compared to the reference VLED. There was a slight sacrifice of operational voltage and leakage current. The improved optical properties are attributed to the multiple scattering of light from the sidewall of the cone-shaped patterns and the increased surface dimension.
Keywords :
III-V semiconductors; gallium compounds; leakage currents; light emitting diodes; light scattering; masks; nanophotonics; nanostructured materials; nickel; optical polymers; spin coating; sputter etching; wide band gap semiconductors; Ni-GaN; VLED; cone-shaped deep-pillar patterns; current 350 mA; deep pillar etching; depth 1.5 mum; double-layered PS beads; hard mask; honeycomb-type vertical light-emitting diodes; leakage current; lift off process; light extraction; metal deposition; multiple light scattering; n-type GaN surface; n-type double-layered polystyrene nanospheres; operational voltage; optical properties; ordered cone-shaped deep-pillar nanostructures; output power; plasma ashing; reference VLED; size 500 nm; spin-coating; surface dimension; Etching; Gallium nitride; Light emitting diodes; Nanostructures; Photonics; Semiconductor device measurement; Cone-shaped; double layer coating; gallium nitride; honeycomb-type; nanosphere lithography; vertical light emitting diode;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.2012.2190587