DocumentCode

1494936

Title

EUV edging out rivals as next-generation IC fab tool

Author

Roush, Wade

Volume

38

Issue

6

fYear

2001

fDate

6/1/2001 12:00:00 AM

Firstpage

25

Lastpage

26

Keywords

Atom optics; Gas lasers; Integrated circuit testing; Laboratories; Lithography; Mirrors; Surface emitting lasers; Transistors; Ultraviolet sources; Xenon;

fLanguage

English

Journal_Title

Spectrum, IEEE

Publisher

ieee

ISSN

0018-9235

Type

jour

DOI

10.1109/MSPEC.2001.925276

Filename

925276