Title :
Thin film vertical diffraction gratings fabricated using glancing angle deposition
Author :
Elezzabi, A.Y. ; Sit, J.C. ; Holzman, J.F. ; Robbie, K. ; Brett, M.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
fDate :
3/18/1999 12:00:00 AM
Abstract :
SiO thin film vertical diffraction gratings fabricated on Si substrates by the use of an advanced glancing angle deposition (GLAD) technique are demonstrated. Diffraction gratings with variable groove heights and variable grating periods ranging from 100 nm to 10 μm are fabricated in a one-step deposition process. Gratings fabricated with this technique have potential applications in integrated photonic devices
Keywords :
diffraction gratings; integrated optics; optical fabrication; silicon compounds; vapour deposition; 100 nm to 10 micron; Si; SiO-Si; glancing angle deposition; integrated photonic devices; one-step deposition process; thin film vertical diffraction gratings; variable grating periods; variable groove heights;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19990340
