DocumentCode
1495831
Title
Thin film vertical diffraction gratings fabricated using glancing angle deposition
Author
Elezzabi, A.Y. ; Sit, J.C. ; Holzman, J.F. ; Robbie, K. ; Brett, M.J.
Author_Institution
Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
Volume
35
Issue
6
fYear
1999
fDate
3/18/1999 12:00:00 AM
Firstpage
491
Lastpage
493
Abstract
SiO thin film vertical diffraction gratings fabricated on Si substrates by the use of an advanced glancing angle deposition (GLAD) technique are demonstrated. Diffraction gratings with variable groove heights and variable grating periods ranging from 100 nm to 10 μm are fabricated in a one-step deposition process. Gratings fabricated with this technique have potential applications in integrated photonic devices
Keywords
diffraction gratings; integrated optics; optical fabrication; silicon compounds; vapour deposition; 100 nm to 10 micron; Si; SiO-Si; glancing angle deposition; integrated photonic devices; one-step deposition process; thin film vertical diffraction gratings; variable grating periods; variable groove heights;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19990340
Filename
756413
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