DocumentCode :
1496740
Title :
Lithium Niobate Ridge Waveguides Fabricated by Ion Implantation Followed by Ion Beam Etching
Author :
Zhao, Jin-Hua ; Liu, Xiu-Hong ; Huang, Qing ; Liu, Peng ; Wang, Xue-Lin
Author_Institution :
Sch. of Phys., Shandong Univ., Jinan, China
Volume :
28
Issue :
13
fYear :
2010
fDate :
7/1/2010 12:00:00 AM
Firstpage :
1913
Lastpage :
1916
Abstract :
A new fabrication method for lithium niobate ridge waveguides is reported. Lithium niobate ridge waveguide with a smooth surface was fabricated by O+ ions implanted combined with Ar ion beam etching. The beam propagation method (BPM) was used to simulate the properties of planar and ridge waveguides by use of a reconstructed refractive index profile. The simulation results match to the experimental results very well, and the loss value of the ridge waveguide is about 2 dB/cm.
Keywords :
ion beams; ion implantation; optical fabrication; optical waveguides; refractive index; sputter etching; Ar; O; beam propagation method; ion beam etching; ion implantation; refractive index; ridge waveguides; Ion radiation effects; optical device fabrication; optical materials; waveguides components;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2010.2050296
Filename :
5467157
Link To Document :
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