• DocumentCode
    1496858
  • Title

    Effects of Negative-Bias Operation and Optical Stress on Dark Current in CMOS Image Sensors

  • Author

    Watanabe, Takashi ; Park, Jong-Ho ; Aoyama, Satoshi ; Isobe, Keigo ; Kawahito, Shoji

  • Author_Institution
    Brookman Technol., Inc., Hamamatsu, Japan
  • Volume
    57
  • Issue
    7
  • fYear
    2010
  • fDate
    7/1/2010 12:00:00 AM
  • Firstpage
    1512
  • Lastpage
    1518
  • Abstract
    A negative-bias operation of the transfer gate has revealed a major origin of dark current defects of CMOS image sensors. Charge injection from the photodiode to the substrate at the negative-bias operation has been avoided by an improved well structure. A strong visible light has been observed to cause damage with an increase in the dark current under the normal operating condition, and the damage has been annealed in the power-off mode. This indicates that the strong light possibly causes a threshold voltage shift, which is explained by the photon-assisted tunneling or emission mechanisms. Multiple stress-and-anneal cycles have been found to cause an optical hardening effect, which can be explained by immobile trapped holes.
  • Keywords
    CMOS image sensors; photodiodes; tunnelling; CMOS image sensor; charge injection; dark current defect; emission mechanism; immobile trapped hole; negative-bias operation; optical hardening effect; optical stress; photodiode; photon-assisted tunneling; power-off mode; stress-and-anneal cycle; substrate; threshold voltage shift; transfer gate; visible light; Annealing; CMOS image sensors; Charge carrier processes; Dark current; Optical sensors; Photodiodes; Stimulated emission; Stress; Threshold voltage; Tunneling; CMOS image sensor (CIS); dark current; negative bias; optical stress; tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2049220
  • Filename
    5467174