• DocumentCode
    1497729
  • Title

    Influence of Growth Field on NiFe, Fe _3 O _4 , and NiFe/Cr/Fe

  • Author

    Jayathilaka, P.B. ; Bauer, C.A. ; Williams, D.V. ; Miller, Casey W.

  • Author_Institution
    Dept. of Phys., Univ. of South Florida, Tampa, FL, USA
  • Volume
    46
  • Issue
    6
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    1777
  • Lastpage
    1779
  • Abstract
    Thin films of Ni80Fe20, Fe3O4, as well as Ni80Fe20/Cr/Fe3O4 spin valves, have been grown with and without magnetic fields applied during the deposition, and their magnetotransport properties have been studied at room temperature. The applied field induces an anisotropy in both single layer films, which causes notable differences in their anisotropic magnetoresistance. In the spin valve system, the applied field enables the parallel and antiparallel states to be more well-defined, which reveals a possible giant magnetoresistance in the system. The origin of this signal is likely the interaction of electrons that have been polarized by spin-dependent reflection from the Cr/Fe3O4 interface with the Ni80Fe20 interface.
  • Keywords
    chromium; giant magnetoresistance; iron compounds; magnetic thin films; nickel compounds; spin valves; Ni80Fe20-Cr-Fe3O4; anisotropic magnetoresistance; antiparallel states; giant magnetoresistance; magnetotransport properties; spin valves; spin-dependent reflection; temperature 293 K to 298 K; thin film growth field; Anisotropic magnetoresistance; Chromium; Giant magnetoresistance; Iron; Magnetic anisotropy; Magnetic fields; Magnetic films; Perpendicular magnetic anisotropy; Spin valves; Sputtering; Half-metal; magnetite; oxide spintronics; spin polarization; spin valve;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2010.2045353
  • Filename
    5467356