DocumentCode :
1497729
Title :
Influence of Growth Field on NiFe, Fe _3 O _4 , and NiFe/Cr/Fe
Author :
Jayathilaka, P.B. ; Bauer, C.A. ; Williams, D.V. ; Miller, Casey W.
Author_Institution :
Dept. of Phys., Univ. of South Florida, Tampa, FL, USA
Volume :
46
Issue :
6
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
1777
Lastpage :
1779
Abstract :
Thin films of Ni80Fe20, Fe3O4, as well as Ni80Fe20/Cr/Fe3O4 spin valves, have been grown with and without magnetic fields applied during the deposition, and their magnetotransport properties have been studied at room temperature. The applied field induces an anisotropy in both single layer films, which causes notable differences in their anisotropic magnetoresistance. In the spin valve system, the applied field enables the parallel and antiparallel states to be more well-defined, which reveals a possible giant magnetoresistance in the system. The origin of this signal is likely the interaction of electrons that have been polarized by spin-dependent reflection from the Cr/Fe3O4 interface with the Ni80Fe20 interface.
Keywords :
chromium; giant magnetoresistance; iron compounds; magnetic thin films; nickel compounds; spin valves; Ni80Fe20-Cr-Fe3O4; anisotropic magnetoresistance; antiparallel states; giant magnetoresistance; magnetotransport properties; spin valves; spin-dependent reflection; temperature 293 K to 298 K; thin film growth field; Anisotropic magnetoresistance; Chromium; Giant magnetoresistance; Iron; Magnetic anisotropy; Magnetic fields; Magnetic films; Perpendicular magnetic anisotropy; Spin valves; Sputtering; Half-metal; magnetite; oxide spintronics; spin polarization; spin valve;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2010.2045353
Filename :
5467356
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