DocumentCode :
1498108
Title :
Enhanced surface segregation in sliding wear tracks
Author :
Kothari, Ranjan ; Vook, Richard W. ; Zhang, Ji-gao ; Zhu, M.D.
Author_Institution :
Dept. of Phys., Syracuse Univ., NY, USA
Volume :
13
Issue :
1
fYear :
1990
fDate :
3/1/1990 12:00:00 AM
Firstpage :
52
Lastpage :
55
Abstract :
The effect of sliding wear on the rate of surface segregation of sulfur from an oxygen-free, high-conductivity (OFHC) copper sample was investigated. The study was carried out in an ultra-high-vacuum system having a residual gas pressure of 5×10-11 torr. Wear tracks were formed on OFHC Cu that had previously been annealed and argon-ion sputter cleaned. A bent pin (palladium-based alloy, ASTM B540) was made to slide across the surface with a contact force of 25 g for 9000 cycles. Auger electron spectroscopy was used to characterize the composition of the surface on and off the wear track. No surface segregation was observed to occur as a result of forming the wear track. Subsequent in situ isothermal annealing between 310°C and 470°C produced S enhancement on the specimen surface. It was observed that the rate of S segregation on the wear track was much faster than off track up to approximately 390°C, where this rate decreased significantly. At higher temperatures, the rate of S segregation on-track approximately equaled the off-track rate. The drop in the rate of S segregation on the track of 390°C is attributed to annealing-out of the short-circuit diffusion paths associated with the defects formed when the wear track was made. The subsequent increase in S concentration at higher temperatures is due to the normal surface segregation phenomenon which occurs in annealed samples
Keywords :
copper; electrical contacts; sulphur; 310 to 470 C; 5E-11 torr; Ar ion cleaning; Auger electron spectroscopy; Cu surface; OFHC Cu; S segregation; contact force; enhanced surface segregation; in situ isothermal annealing; rate of surface segregation; residual gas pressure; sliding wear tracks; sputter cleaned; ultra-high-vacuum system; Annealing; Argon; Contacts; Copper alloys; Impurities; Lattices; Sheet materials; Surface resistance; Temperature; Vacuum systems;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/33.52849
Filename :
52849
Link To Document :
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