• DocumentCode
    1498846
  • Title

    The fate of stacking

  • Author

    Kung, David S.

  • Author_Institution
    IBM T.J. Watson Research Center
  • Volume
    26
  • Issue
    5
  • fYear
    2009
  • Firstpage
    112
  • Lastpage
    112
  • Abstract
    The impending doom of CMOS scaling has semiconductor mavericks scrambling for alternative solutions to continue increasing the device density per chip. One serious candidate is 3D integration in which the planar manufacturing technology extends skyward into the third dimension, much like skyscrapers. Similarities between chip architecture and building architecture are plentiful, and the author draws some parallels between the two.
  • Keywords
    Architecture; Buildings; CMOS technology; Floors; Licenses; Mass production; Semiconductor device manufacture; Stacking; Steel; Three-dimensional integrated circuits; 3D IC; CMOS scaling; design and test; stacking;
  • fLanguage
    English
  • Journal_Title
    Design & Test of Computers, IEEE
  • Publisher
    ieee
  • ISSN
    0740-7475
  • Type

    jour

  • DOI
    10.1109/MDT.2009.127
  • Filename
    5286158