DocumentCode :
1498846
Title :
The fate of stacking
Author :
Kung, David S.
Author_Institution :
IBM T.J. Watson Research Center
Volume :
26
Issue :
5
fYear :
2009
Firstpage :
112
Lastpage :
112
Abstract :
The impending doom of CMOS scaling has semiconductor mavericks scrambling for alternative solutions to continue increasing the device density per chip. One serious candidate is 3D integration in which the planar manufacturing technology extends skyward into the third dimension, much like skyscrapers. Similarities between chip architecture and building architecture are plentiful, and the author draws some parallels between the two.
Keywords :
Architecture; Buildings; CMOS technology; Floors; Licenses; Mass production; Semiconductor device manufacture; Stacking; Steel; Three-dimensional integrated circuits; 3D IC; CMOS scaling; design and test; stacking;
fLanguage :
English
Journal_Title :
Design & Test of Computers, IEEE
Publisher :
ieee
ISSN :
0740-7475
Type :
jour
DOI :
10.1109/MDT.2009.127
Filename :
5286158
Link To Document :
بازگشت