• DocumentCode
    1498918
  • Title

    Direct Comparison of Charge Collection in SOI Devices From Single-Photon and Two-Photon Laser Testing Techniques

  • Author

    Schwank, James R. ; Shaneyfelt, Marty R. ; Dodd, Paul E. ; McMorrow, Dale ; Vizkelethy, Gyorgy ; Ferlet-Cavrois, Véronique ; Gouker, Pascale M. ; Flores, Richard S. ; Stevens, Jeffrey ; Buchner, Stephen B. ; Dalton, Scott M. ; Swanson, Scot E.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • Volume
    58
  • Issue
    3
  • fYear
    2011
  • fDate
    6/1/2011 12:00:00 AM
  • Firstpage
    820
  • Lastpage
    826
  • Abstract
    The amounts of charge collection by single-photon absorption (SPA) and by two-photon absorption (TPA) laser testing techniques have been directly compared using specially made SOI diodes. For SPA measurements and some TPA measurements, the back substrates of the diodes were removed by etching with XeF2. With the back substrates removed, the amount of TPA induced charge collection can be correlated to the amount of SPA induced charge collection. There are significant differences, however, in the amount of TPA induced charge collection for diodes with and without substrates. For the SOI diodes of this study, this difference appears to arise from several contributions, including nonlinear-optical losses and distortions that occur as the pulse propagates through the substrate, as well as displacement currents that occur only when the back substrate is present. These results illustrate the complexity of interpreting TPA and SPA single-event upset measurements.
  • Keywords
    etching; semiconductor device testing; semiconductor diodes; silicon-on-insulator; two-photon processes; xenon compounds; SOI diode; Si; XeF2; charge collection; displacement current; etching; nonlinear-optical distortion; nonlinear-optical loss; pulse propagation; single-event upset measurement; single-photon absorption laser testing technique; two-photon absorption laser testing technique; Charge measurement; Measurement by laser beam; Metals; Semiconductor lasers; Silicon; Substrates; Hardness assurance; heavy-ion testing; laser testing; single-event upset (SEU); threshold LET; two-photon absorption (TPA);
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2011.2128345
  • Filename
    5752885