• DocumentCode
    1499045
  • Title

    Continuous equipment diagnosis using evidence integration: an LPCVD application

  • Author

    Chang, Norman H. ; Spanos, Costas J.

  • Author_Institution
    Hewlett-Packard Labs., Palo Alto, CA, USA
  • Volume
    4
  • Issue
    1
  • fYear
    1991
  • fDate
    2/1/1991 12:00:00 AM
  • Firstpage
    43
  • Lastpage
    51
  • Abstract
    A diagnostic system that employs the Dempster-Shafer (D-S) evidential reasoning technique to conduct malfunction diagnosis on semiconductor manufacturing equipment has been developed. This is accomplished by combining the continuous stream of information that originates from maintenance status records, from real-time sensor measurements, and from the differences between inline measurements and values predicted by equipment models. Using this information, equipment malfunctions are analyzed and their causes are inferred through the resolution of qualitative and quantitative constraints. The qualitative constraints describe the normal operation of the equipment. The quantitative constraints are numerical models that apply to the manufacturing step in question. These models are specifically created and characterized through experimentation and statistical analysis, and they can be updated to reflect equipment aging. The violation of these constraints is linked to the evaluation of continuous belief functions for the calculation of the belief associated with the various types of failure. The belief functions encapsulate the experience of many equipment maintenance specialists. Once created, the belief functions can be fine-tuned automatically, drawing from historical maintenance records. These records are stored in symbolic form to facilitate this task, and they must be updated to track equipment changes over time. A prototype of this diagnostic system was implemented in an object-oriented programming environment. The effectiveness of this technique was demonstrated on a low-pressure chemical vapor deposition (LPCVD) reactor used for the deposition of undoped polysilicon
  • Keywords
    chemical vapour deposition; integrated circuit manufacture; process computer control; Dempster Shafer evidential reasoning technique; LPCVD application; continuous equipment diagnosis; continuous stream of information; deposition of undoped polysilicon; differences between inline measurements and values predicted; equipment aging; equipment malfunctions; equipment models; evidence integration; expert systems; historical maintenance records; low-pressure chemical vapor deposition; maintenance status records; malfunction causes inference; malfunction diagnosis; numerical models; object-oriented programming environment; qualitative constraints; quantitative constraints; real-time sensor measurements; semiconductor manufacturing equipment; statistical analysis; track equipment changes over time; types of failure; Aging; Information analysis; Numerical models; Object oriented modeling; Object oriented programming; Predictive models; Prototypes; Semiconductor device manufacture; Statistical analysis; Virtual manufacturing;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.75851
  • Filename
    75851