DocumentCode :
1499411
Title :
Antiferromagnetically Coupled Patterned Media and Control of Switching Field Distribution
Author :
Ranjbar, Mojtaba ; Piramanayagam, S.N. ; Suzi, Deng ; Aung, Kyaw Oo ; Sbiaa, Rachid ; Kay, Yew Seng ; Wong, Seng Kai ; Chong, Chong Tow
Author_Institution :
Data Storage Inst., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Volume :
46
Issue :
6
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
1787
Lastpage :
1790
Abstract :
Switching Field distribution (SFD) is one of the critical issues for writing in bit patterned media (BPM) for high areal densities. It is believed that the magnetostatic interaction is one of the several factors that contribute to the SFD. With the antiferromagnetically coupled (AFC) structure, the magnetostatic interaction can be tailored to understand/reduce SFD. In this study, AFC patterned media is studied with emphasis placed on the effect of the top layer coercivity, which will determine the Mr and hence the magnetostatic interaction. For this study, nanodots with a size and space of 60 and 40 nm respectively were fabricated with electron beam lithography (EBL). Remanent hysteresis curves for the nanodot arrays were obtained by counting the number of reversed dots in magnetic force microscopy (MFM) images at remanent state. The narrowest SFD at a pressure of 1 Pa for top layer was observed possibly because of good crystaline texture and reduced magnetostatic interaction.
Keywords :
antiferromagnetic materials; coercive force; electron beam lithography; magnetic force microscopy; magnetic hysteresis; magnetic recording; magnetic structure; magnetic switching; magnetostatics; remanence; antiferromagnetically coupled structure; bit patterned media; coercivity; crystaline texture; electron beam lithography; magnetic force microscopy; magnetostatic interaction; nanodot arrays; pressure 1 Pa; remanent hysteresis curves; size 60 nm; switching field distribution; Antiferromagnetic materials; Automatic frequency control; Coercive force; Couplings; Electron beams; Lithography; Magnetic force microscopy; Magnetosphere; Magnetostatics; Writing; Antiferromagnetically coupled patterned media; magnetostatic interactions; switching field distribution;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2010.2043226
Filename :
5467591
Link To Document :
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