Tailoring Spin Relaxation in Thin Films by Tuning Extrinsic Relaxation Channels

Author

Barsukov, Igor ; Meckenstock, Ralf ; Lindner, Jürgen ; Möller, Marc ; Hassel, Christoph ; Posth, Oliver ; Farle, Michael ; Wende, Heiko

Author_Institution

Fak. fur Phys. & Center for Nanointegration, Univ. Duisburg-Essen, Duisburg, Germany

Volume

46

Issue

6

fYear

2010

fDate

6/1/2010 12:00:00 AM

Firstpage

2252

Lastpage

2255

Abstract

The importance of extrinsic spin relaxation processes such as magnon-magnon scattering for the overall damping in ferromagnetic thin films has been shown for low relaxation rate systems. Due to its anisotropic behavior, it offers an opportunity for controlling and tailoring the spin relaxation. In this paper, a ferromagnetic resonance study of a system with pure Gilbert damping Fe_94.5Si_5.5/MgO(001) is shown. Fe₃Si/MgO(001) systems with native magnon-magnon scattering are discussed. Possibilities for inducing magnon-magnon scattering by volume and surface defects in these systems are presented, offering a method for controlled tailoring of the overall damping in thin films.

Keywords

damping; ferromagnetic materials; ferromagnetic relaxation; ferromagnetic resonance; iron alloys; magnesium compounds; magnetic anisotropy; magnetic thin films; magnons; silicon alloys; spin dynamics; Fe₃Si/MgO(001) systems; Fe_94.5Si_5.5-MgO; anisotropic behavior; controlled tailoring; extrinsic relaxation channels; extrinsic spin relaxation processes; ferromagnetic resonance study; ferromagnetic thin films; low relaxation rate systems; native magnon-magnon scattering; overall damping; pure Gilbert damping; surface defects; Anisotropic magnetoresistance; Damping; Frequency dependence; Iron; Magnetic anisotropy; Magnetic resonance; Magnetization; Scattering; Torque; Transistors; Magnetic resonance; relaxation processes; thin films;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2010.2044482

Filename

5467613