Title :
Observation of Suppressed Interdiffusion in FeRh/FePt-Ta Bilayer Thin Films
Author :
Jang, Sung-Uk ; Park, Eon Byeong ; Kim, Ji-Hong ; Park, Ki-Hoon ; Lee, Ji Sung ; Kim, Young Keun ; Hyun, Seungmin ; Lee, Hak-Joo ; Kwon, Soon-Ju ; Lee, Hwan-Soo
Author_Institution :
Dept. of Mater. Sci. & Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
fDate :
6/1/2010 12:00:00 AM
Abstract :
FeRh/FePt bilayers on MgO (100) substrates were fabricated by rf-magnetron sputtering, and the magnetic properties and microstructures of the bilayers were studied in terms of Ta addition to the storage layer. Compared to undoped FeRh/FePt bilayers, FeRh/FePt-Ta bilayer films showed improved magnetic properties and lower degree of interdiffusion. The FeRh/FePt-Ta bilayers clearly demonstrated the AFM-FM transition. Reduced interdiffusion by Ta segregation along grain boundaries was speculated to be a possible cause for the observed improvement in magnetic properties when fabricated at high temperature.
Keywords :
chemical interdiffusion; ferromagnetic-antiferromagnetic transitions; grain boundaries; iron alloys; magnetic multilayers; magnetic thin films; platinum alloys; rhodium alloys; segregation; sputter deposition; tantalum; FeRh-FePt-Ta; MgO; antiferromagnetic-ferromagnetic transition; bilayer thin films; grain boundaries; high-temperature effects; microstructure; rf-magnetron sputtering; segregation; storage layer; suppressed interdiffusion; Anisotropic magnetoresistance; Laboratories; Magnetic films; Magnetic materials; Magnetic properties; Materials science and technology; Microstructure; Substrates; Temperature; Transistors; FePt-Ta; FeRh/FePt-Ta bilayer; ferromagnetic and antiferromagentic transition; interdiffusion;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2010.2042148
