• DocumentCode
    1500350
  • Title

    Laser deposition of quality high Tc superconductor films

  • Author

    Chang, C.C. ; Venkatesan, T. ; Wu, X.D. ; Inam, A. ; Chase, E.W. ; Hwang, D.M. ; Tarascon, J.M. ; Barboux, P. ; England, P. ; Wilkens, B.J.

  • Author_Institution
    Bellcore, Red Bank, NJ, USA
  • Volume
    25
  • Issue
    2
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    2441
  • Lastpage
    2444
  • Abstract
    The laser deposition technique has been developed into a versatile method for depositing films of YBa2Cu3Ox material. A brief description is given of the method and important materials characteristics, such as composition, surface smoothness, crystalline structure, and interactions with substrates. Tc over 93 K, Jc in the 106 A/cm2 range at 77 K, tolerance to high magnetic fields, low temperature deposition (near 650°C), as-deposited superconducting films, epitaxial growth, and very smooth surfaces have been demonstrated. Relevance to practical application is briefly discussed
  • Keywords
    barium compounds; critical current density (superconductivity); crystal atomic structure of inorganic compounds; high-temperature superconductors; laser beam applications; superconducting thin films; superconducting transition temperature; surface topography; vapour deposition; vapour phase epitaxial growth; yttrium compounds; 77 K; 93 K; YBa2Cu3Ox; as-deposited superconducting films; composition; critical current density; crystalline structure; epitaxial growth; high Tc superconductor films; high magnetic fields; high temperature superconductors; laser deposition technique; low temperature deposition; materials characteristics; substrate interactions; surface smoothness; transition temperature; Composite materials; Crystalline materials; Crystallization; Epitaxial growth; Magnetic fields; Magnetic materials; Optical materials; Substrates; Superconducting films; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.92800
  • Filename
    92800