DocumentCode
1500391
Title
High T c BiSrCaCuO superconductor grown by CVD technique
Author
Ihara, M. ; Kimura, T. ; Yamawaki, H. ; Ikeda, K.
Author_Institution
Fujitsu Lab. Ltd., Atsugi, Japan
Volume
25
Issue
2
fYear
1989
fDate
3/1/1989 12:00:00 AM
Firstpage
2470
Lastpage
2473
Abstract
Single-crystal high-T c BiSrCaCuO films were grown on (100) MgO substrates in an open-tube chemical-vapor deposition (CVD) system using metal-halide sources and oxygen gas. The morphology of the BiSrCaCuO superconducting layers and MgO insulating layers was satisfactory. The resistivities of the high-T c layers at 300 K and critical temperatures were ρ=5-20 mΩ-cm and T c=70-80 K for Bi1Sr0.8Ca 1Cu3.7Ox layers 0.1-to-0.3-μm thick on MgO substrates. The CVD system and characteristics of the high-T c layers and MgO heteroepitaxial layers as a substrate are discussed
Keywords
bismuth compounds; calcium compounds; chemical vapour deposition; high-temperature superconductors; insulating thin films; magnesium compounds; strontium compounds; superconducting thin films; superconducting transition temperature; 300 K; 70 to 80 K; BiSrCaCuO films; MgO; chemical-vapor deposition; critical temperatures; high temperature superconductors; insulating layers; morphology; superconducting layers; Bismuth; Chemical vapor deposition; Conductivity; Insulation; Morphology; Strontium; Substrates; Superconducting epitaxial layers; Superconducting films; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.92808
Filename
92808
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