• DocumentCode
    1500391
  • Title

    High Tc BiSrCaCuO superconductor grown by CVD technique

  • Author

    Ihara, M. ; Kimura, T. ; Yamawaki, H. ; Ikeda, K.

  • Author_Institution
    Fujitsu Lab. Ltd., Atsugi, Japan
  • Volume
    25
  • Issue
    2
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    2470
  • Lastpage
    2473
  • Abstract
    Single-crystal high-Tc BiSrCaCuO films were grown on (100) MgO substrates in an open-tube chemical-vapor deposition (CVD) system using metal-halide sources and oxygen gas. The morphology of the BiSrCaCuO superconducting layers and MgO insulating layers was satisfactory. The resistivities of the high-Tc layers at 300 K and critical temperatures were ρ=5-20 mΩ-cm and Tc=70-80 K for Bi1Sr0.8Ca 1Cu3.7Ox layers 0.1-to-0.3-μm thick on MgO substrates. The CVD system and characteristics of the high-T c layers and MgO heteroepitaxial layers as a substrate are discussed
  • Keywords
    bismuth compounds; calcium compounds; chemical vapour deposition; high-temperature superconductors; insulating thin films; magnesium compounds; strontium compounds; superconducting thin films; superconducting transition temperature; 300 K; 70 to 80 K; BiSrCaCuO films; MgO; chemical-vapor deposition; critical temperatures; high temperature superconductors; insulating layers; morphology; superconducting layers; Bismuth; Chemical vapor deposition; Conductivity; Insulation; Morphology; Strontium; Substrates; Superconducting epitaxial layers; Superconducting films; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.92808
  • Filename
    92808