DocumentCode :
1500827
Title :
Characterization of Nb/AlOx-Al/Nb junction structures by anodization spectroscopy
Author :
Imamura, Takeshi ; Hasuo, Shinya
Author_Institution :
Fujitsu Ltd., Atsugi, Japan
Volume :
25
Issue :
2
fYear :
1989
fDate :
3/1/1989 12:00:00 AM
Firstpage :
1131
Lastpage :
1134
Abstract :
The thin tunneling barrier in a Nb/AlOx-Al/Nb Josephson junction was characterized by anodization spectroscopy. Nb/AlOx and Al/Nb interfaces made by varying certain process parameters were examined. The interface quality is greatly affected by film thickness, layer sequence, annealing, and existence of a thin oxide. It is concluded that anodization spectroscopy is a useful technique to diagnose the tunneling barrier in the Nb/AlOx-Al/Nb Josephson junctions during fabrication processes
Keywords :
Josephson effect; aluminium; aluminium compounds; annealing; anodisation; niobium; spectroscopy; superconducting junction devices; type II superconductors; Josephson junction; Nb-AlOx-Al-Nb; Nb/AlOx-Al/Nb junction structures; annealing; anodization spectroscopy; fabrication; film thickness; interface quality; layer sequence; process parameters variation; superconducting junctions; thin oxide; thin tunneling barrier; Computer industry; Josephson junctions; Monitoring; Niobium; Nonhomogeneous media; Passivation; Spectroscopy; Sputtering; Substrates; Tunneling;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.92840
Filename :
92840
Link To Document :
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