Title :
Application of ink jet technology on photovoltaic metallization
Author :
Teng, K.F. ; Vest, R.W.
Author_Institution :
Coll. of Eng., Mississippi State Univ., MS, USA
Abstract :
Computer-controlled ink-jet assisted metallization of the grid pattern of solar cells with metallo-organic decomposition (MOD) silver inks offers a maskless alternative method to conventional photolithographic thin-film technology and screen-printing technology. This method can provide low-cost, fine-resolution reduction in process complexity by direct ink-jet patterning, avoidance of degradation of p-n junctions by firing at low temperature (350 degrees C), and uniform line film on rough-surface solar cells (unpolished solar cells for low-cost purposes). The metallization process involves jet-printed metallo-organic inks, belt furnace firing, and thermal spiking. With titanium thin-film underlayer as an adhesion promoter and multilayer ink jet printing, solar cells of 8.08% average efficiency without AR coating can be obtained. This efficiency value is approximately equal to that of thin-film metallized solar cells of the same lot.<>
Keywords :
coating techniques; metallisation; semiconductor technology; solar cells; 350 degC; 8.08 percent; Ag inks; Ti thin-film underlayer; adhesion promoter; belt furnace firing; direct ink-jet patterning; fine-resolution reduction; grid pattern; ink jet technology; low temperature firing; low-cost; maskless method; metallo-organic decomposition; metallo-organic inks; photovoltaic metallization; rough surface cells; solar cells; thermal spiking; Application software; Firing; Grid computing; Ink; Metallization; Photovoltaic cells; Photovoltaic systems; Silver; Solar power generation; Transistors;
Journal_Title :
Electron Device Letters, IEEE
