DocumentCode :
1501583
Title :
An 0.03 μm gate-length enhancement-mode InAlAs/InGaAs/InP MODFET´s with 300 GHz fT and 2 S/mm extrinsic transconductance
Author :
Xu, D. ; Suemitsu, T. ; Osaka, J. ; Umeda, Y. ; Yamane, Y. ; Ishii, Y. ; Ishii, T. ; Tamamura, T.
Author_Institution :
Syst. Electron. Labs., Nippon Telegraph & Telephone Corp., Kanagawa, Japan
Volume :
20
Issue :
5
fYear :
1999
fDate :
5/1/1999 12:00:00 AM
Firstpage :
206
Lastpage :
208
Abstract :
We have developed high-performance enhancement-mode InP-based modulation-doped field-effect transistors with 0.03 μm gate-length. A record high current gain cutoff frequency exceeding 300 GHz has been achieved, and the maximum extrinsic transconductance is as high as 2 S/mm with an associated drain current of 0.5 A/mm at a drain bias of 1 V. This high performance is a result of the reduction or gate length, the use of the high barrier metal Pt as gate electrodes, and most importantly the employment of the well-developed wet-etching technology that allows the formation of a very deep gate groove while retaining small side etching. The excellent E-MODFET performance opens up the possibility of implementing ever faster high-speed circuits based on direct-coupled FET logic.
Keywords :
III-V semiconductors; aluminium compounds; etching; gallium arsenide; high electron mobility transistors; indium compounds; 0.03 micron; 300 GHz; InAlAs-InGaAs-InP; InAlAs/InGaAs/InP E-MODFET; Pt gate electrode; current gain cutoff frequency; direct-coupled FET logic; enhancement mode modulation doped field effect transistor; extrinsic transconductance; high-speed circuit; wet etching; Cutoff frequency; Electrodes; Employment; Epitaxial layers; FETs; Indium compounds; Indium gallium arsenide; Indium phosphide; Performance gain; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.761016
Filename :
761016
Link To Document :
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