Title :
Field-Plate Structure Dependence of Current Collapse Phenomena in High-Voltage GaN-HEMTs
Author :
Saito, Wataru ; Kakiuchi, Yorito ; Nitta, Tomohiro ; Saito, Yasunobu ; Noda, Takao ; Fujimoto, Hidetoshi ; Yoshioka, Akira ; Ohno, Tetsuya ; Yamaguchi, Masakazu
Author_Institution :
Semicond. Co., Toshiba Corp., Kawasaki, Japan
fDate :
7/1/2010 12:00:00 AM
Abstract :
Four types of the field-plate (FP) structure were fabricated to discuss the relation between the current collapse phenomena and the electric-field peak in high-voltage GaN-HEMTs. The on -resistance increase caused by current collapse phenomena is dramatically reduced by the single-gate-FP and dual-FP structures compared with the source-FP structure, because the gate-edge electric field was reduced by the gate-FP electrode. The dual-FP structure was slightly more effective to suppress the collapse phenomena than the single-gate-FP structure, because the two-step FP structure relaxes the electric-field concentration at the FP edge. These results show that the gate-edge peak strongly affects the on -resistance modulation. Although the FP edge peak also causes the collapse phenomena, its influence is weak.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; GaN; current collapse phenomena; dual-FP structure; electric-field peak; field-plate structure dependence; gate-FP electrode; gate-edge electric field; high-voltage GaN-HEMT; single-gate-FP structure; GaN; HEMT; high voltage; power semiconductor device;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2048741