• DocumentCode
    1502886
  • Title

    Improved Regrowth Interface of AlGaInAs/InP-Buried-Heterostructure Lasers by In-Situ Thermal Cleaning

  • Author

    Takino, Yuta ; Shirao, Mizuki ; Sato, Noriaki ; Sato, Takashi ; Amemiya, Tomohiro ; Nishiyama, Nobuhiko ; Arai, Shigehisa

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
  • Volume
    48
  • Issue
    8
  • fYear
    2012
  • Firstpage
    971
  • Lastpage
    979
  • Abstract
    The influence of in-situ thermal cleaning on the regrowth interface quality of 1.3-μm wavelength AlGaInAs/InP-buried-heterostructure (BH) lasers grown by organo-metallic vapor-phase epitaxy was investigated. The surface recombination velocity estimated from below threshold electroluminescence measurements was used to quantitatively study regrowth interface quality. The relationship between surface recombination velocity and lasing properties was supported by theory. In this way, we could validate the use of surface recombination velocity as a measure of interface quality. In-situ thermal cleaning at 650°C for 45 min under PH3 atmosphere resulted in operational BH lasers (1.6 μm stripe width) with a differential quantum efficiency of 66% and an internal quantum efficiency of approximately 76%.
  • Keywords
    III-V semiconductors; aluminium compounds; electroluminescence; gallium compounds; indium compounds; semiconductor lasers; surface cleaning; surface recombination; vapour phase epitaxial growth; AlGaInAs-InP; buried heterostructure lasers; electroluminescence measurements; in-situ thermal cleaning; interface quality; organometallic vapor phase epitaxy; regrowth interface; surface recombination velocity; temperature 650 C; time 45 min; wavelength 1.3 mum; Atmosphere; Cleaning; Indium phosphide; Lasers; Measurement by laser beam; Radiative recombination; AlGaInAs/InP; buried-heterostructure; organo-metallic vapor-phase epitaxy; thermal cleaning;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.2012.2196410
  • Filename
    6189724