DocumentCode :
1503090
Title :
A Unified Carrier-Transport Model for the Nanoscale Surrounding-Gate MOSFET Comprising Quantum–Mechanical Effects
Author :
Hu, Guangxi ; Gu, Jinglun ; Hu, Shuyan ; Ding, Ying ; Liu, Ran ; Tang, Ting-ao
Author_Institution :
State Key Lab. of Applic.-Specific Integrated Circuits & Syst., Fudan Univ., Shanghai, China
Volume :
58
Issue :
7
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
1830
Lastpage :
1836
Abstract :
A unified carrier-transport model for a nanoscale surrounding-gate metal-oxide-semiconductor field-effect transistor (SG MOSFET) is developed. The model is based on McKelvey´s flux theory and includes quantum-mechanical effects. The model is applicable for both ballistic- and diffusive-transport regimes. The model results fit with the simulation results extremely well in both transport regimes for the small drain biases VDS <; 1 V. With the model, the characteristics of a drain-to-source current of an SG MOSFET working in the linear region can be very quickly and easily obtained. The model will provide some guidance for the practical use of SG nanowire transistors.
Keywords :
MOSFET; nanowires; ballistic-transport; diffusive-transport; drain-to-source current; nanoscale SG MOSFET; nanoscale surrounding-gate MOSFET; nanowire transistors; quantum-mechanical effects; unified carrier-transport model; Backscatter; Logic gates; MOSFET circuits; Silicon; Simulation; Solid modeling; Transistors; Device simulation; nanowire; semiconductor device modeling; surrounding-gate metal–oxide–semiconductor field-effect transistors (SG MOSFETs);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2136343
Filename :
5755186
Link To Document :
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