Etch alignment of CCD mosaic hybrid

Author

Chapman, Scott C. ; Burley, Gregory S. ; Walker, Gordon A H ; Parameswaran, Ash

Author_Institution

British Columbia Univ., Vancouver, BC, Canada

Volume

20

Issue

2

fYear

1997

fDate

5/1/1997 12:00:00 AM

Firstpage

133

Lastpage

140

Abstract

By relying on semiconductor lithography and processing techniques, we have fabricated a flat, precision aligned charge-coupled device (CCD) mosaic for astronomy. Modifications to the lithographic techniques used in micromachining lead to a significant reduction in various residue deposits, allowing a smooth surface suitable for CCD alignment. Details of the technique and the fabrication of a prototype mosaic are described. The composite device is flat to within ±5 μm, with rows/columns oriented to within 20 ppm. The use of an existing technology with built in precision reduces many of the difficulties and expenses typically encountered with mosaic detector construction

Keywords

CCD image sensors; etching; integrated circuit technology; lithography; micromachining; silicon; CCD mosaic hybrid; Si; charge-coupled device mosaic; composite device; etch alignment; fabrication; lithographic techniques; micromachining; precision aligned CCD; smooth surface; Assembly; Charge coupled devices; Detectors; Etching; Fabrication; Lithography; Micromachining; Packaging machines; Sensor arrays; Substrates;

fLanguage

English

Journal_Title

Components, Packaging, and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on

Publisher

ieee

ISSN

1070-9894

Type

jour

DOI

10.1109/96.575564

Filename

575564