• DocumentCode
    1503858
  • Title

    Generation of Rayleigh/Rician Fading Channels With Variable RMS Delay by Changing Boundary Conditions of the Reverberation Chamber

  • Author

    Choi, Jung-Hwan ; Park, Seong-Ook ; Yang, Tae-Sik ; Byun, Joon-Ho

  • Author_Institution
    Dept. of Inf. & Commun. Eng., Korea Adv. Inst. of Sci. & Technol. (KAIST), Daejeon, South Korea
  • Volume
    9
  • fYear
    2010
  • fDate
    7/2/1905 12:00:00 AM
  • Firstpage
    510
  • Lastpage
    513
  • Abstract
    This letter presents the properties of the generated Rayleigh/Rician fading channels in the reverberation chamber (RC) experimentally. Radio propagation channels that undergo multipath fading phenomena can be characterized by power delay profiles (PDPs), delay spreads, and statistical distributions of the received power. The RC under the conventional configuration for electromagnetic compatibility/electromagnetic interference (EMC/EMI) evaluations has Rayleigh distribution because there are no direct paths between the TX and RX antennas. Most of the transmitted signals arrive at the RX part through multiple reflection paths. By changing the boundary conditions and the position of the TX antenna, Rayleigh/Rician fading channels with variable root-mean-square (RMS) delay spread can be generated in the RC considering K-factor simultaneously.
  • Keywords
    Rayleigh channels; electromagnetic compatibility; reverberation chambers; statistical analysis; transmitting antennas; Rayleigh fading channels; Rician fading channels; TX antenna; changing boundary conditions; delay spreads; electromagnetic compatibility; electromagnetic interference; multiple reflection paths; power delay profiles; radio propagation channels; reverberation chamber; statistical distributions; variable root-mean-square delay; Boundary conditions; K-factor; Rayleigh distribution; Rician distribution; delay spread; power delay profile (PDP); reverberation chamber (RC);
  • fLanguage
    English
  • Journal_Title
    Antennas and Wireless Propagation Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1536-1225
  • Type

    jour

  • DOI
    10.1109/LAWP.2010.2051400
  • Filename
    5473103