DocumentCode :
1504027
Title :
High temperature operation of alpha -silicon carbide buried-gate junction field-effect transistors
Author :
Kelner, G. ; Shur, M. ; Palmour, J.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Volume :
27
Issue :
12
fYear :
1991
fDate :
6/6/1991 12:00:00 AM
Firstpage :
1038
Lastpage :
1040
Abstract :
The high temperature operation of alpha -SiC buried-gate junction field-effect transistors is reported. Devices fabricated with a 4 mu m gate length have a maximum transconductance of 17 mS/mm and a maximum drain saturation current of 450 mA/mm at room temperature. The devices are completely pinched off at a gate voltage of -40 V. Devices with a gate length of 39 mu m have a transconductance of 5.4 mS/mm at room temperature which decreases to 1.7 mS/mm at 400 degrees C. This decrease in transconductance is due to the reduction of mobility with increasing temperature. The values of transconductances at room temperature and at elevated temperatures are the highest reported for alpha -SiC JFETs.
Keywords :
junction gate field effect transistors; semiconductor materials; silicon compounds; -40 V; 39 micron; 4 micron; JFET; SiC; buried-gate junction field-effect transistors; drain saturation current; gate length; gate voltage; high temperature operation; maximum transconductance; mobility; pinched off;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910646
Filename :
76219
Link To Document :
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