DocumentCode
1504027
Title
High temperature operation of alpha -silicon carbide buried-gate junction field-effect transistors
Author
Kelner, G. ; Shur, M. ; Palmour, J.
Author_Institution
Naval Res. Lab., Washington, DC, USA
Volume
27
Issue
12
fYear
1991
fDate
6/6/1991 12:00:00 AM
Firstpage
1038
Lastpage
1040
Abstract
The high temperature operation of alpha -SiC buried-gate junction field-effect transistors is reported. Devices fabricated with a 4 mu m gate length have a maximum transconductance of 17 mS/mm and a maximum drain saturation current of 450 mA/mm at room temperature. The devices are completely pinched off at a gate voltage of -40 V. Devices with a gate length of 39 mu m have a transconductance of 5.4 mS/mm at room temperature which decreases to 1.7 mS/mm at 400 degrees C. This decrease in transconductance is due to the reduction of mobility with increasing temperature. The values of transconductances at room temperature and at elevated temperatures are the highest reported for alpha -SiC JFETs.
Keywords
junction gate field effect transistors; semiconductor materials; silicon compounds; -40 V; 39 micron; 4 micron; JFET; SiC; buried-gate junction field-effect transistors; drain saturation current; gate length; gate voltage; high temperature operation; maximum transconductance; mobility; pinched off;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19910646
Filename
76219
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