• DocumentCode
    1504027
  • Title

    High temperature operation of alpha -silicon carbide buried-gate junction field-effect transistors

  • Author

    Kelner, G. ; Shur, M. ; Palmour, J.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • Volume
    27
  • Issue
    12
  • fYear
    1991
  • fDate
    6/6/1991 12:00:00 AM
  • Firstpage
    1038
  • Lastpage
    1040
  • Abstract
    The high temperature operation of alpha -SiC buried-gate junction field-effect transistors is reported. Devices fabricated with a 4 mu m gate length have a maximum transconductance of 17 mS/mm and a maximum drain saturation current of 450 mA/mm at room temperature. The devices are completely pinched off at a gate voltage of -40 V. Devices with a gate length of 39 mu m have a transconductance of 5.4 mS/mm at room temperature which decreases to 1.7 mS/mm at 400 degrees C. This decrease in transconductance is due to the reduction of mobility with increasing temperature. The values of transconductances at room temperature and at elevated temperatures are the highest reported for alpha -SiC JFETs.
  • Keywords
    junction gate field effect transistors; semiconductor materials; silicon compounds; -40 V; 39 micron; 4 micron; JFET; SiC; buried-gate junction field-effect transistors; drain saturation current; gate length; gate voltage; high temperature operation; maximum transconductance; mobility; pinched off;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19910646
  • Filename
    76219