DocumentCode :
1504262
Title :
High-resolution pressure sensors fabricated by silicon wafer direct bonding
Author :
Chung, G.S. ; Kawahito, S. ; Ishida, Makoto ; Nakamura, T.
Author_Institution :
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
Volume :
27
Issue :
12
fYear :
1991
fDate :
6/6/1991 12:00:00 AM
Firstpage :
1098
Lastpage :
1100
Abstract :
Silicon diaphragm pressure sensors have been fabricated on SOI structures to reduce the pressure sensitivity variation. The SOI structure, made by direct bonding two oxidised silicon wafer together, was used as an etch-stop layer during diaphragm formation and for controlling the diaphragm thickness. The pressure sensitivity variation can be controlled to within a standard deviation of +or-2.3% from wafer to wafer.
Keywords :
electric sensing devices; elemental semiconductors; pressure measurement; pressure transducers; semiconductor devices; silicon; SOI structures; Si; Si wafer direct bonding; diaphragm formation; diaphragm thickness; etch-stop layer; high-resolution type; oxidised wafers; pressure sensitivity variation; pressure sensors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910682
Filename :
76238
Link To Document :
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