Title :
Capitalizing on the Glass-Etching Effect of Silver Plating Chemistry to Contact Si Solar Cells With Homogeneous 100–110
Emitters
Author :
Ebong, Abasifreke ; Cooper, Ian B. ; Rounsaville, Brian C. ; Rohatgi, Ajeet ; Dovrat, Miki ; Kritchman, Eli ; Brusilovsky, David ; Benichou, Axel
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of North Carolina, Charlotte, NC, USA
fDate :
6/1/2011 12:00:00 AM
Abstract :
Homogeneous high-sheet-resistance emitter (HHSE), excellent surface passivation, and high-quality contacts, along with narrow gridlines, are needed for high-efficiency solar cells. However, HHSE in conjunction with screen-printed (SP) contacts often gives low fill factor (FF) because of high contact resistance. We capitalized on the glass-etching property of light-induced plating of silver to decrease the contact resistance and formed high-quality contacts to 100-110 Ω/sq HHSE. This led to the achievement of 78.5% FF, 38.3 mA/cm2 short-circuit current density (JSC) due to narrow line widths (65 μm), and efficiency of 18.7%.
Keywords :
contact resistance; current density; elemental semiconductors; etching; glass; passivation; silicon; silver; solar cells; Ag; Si; contact Si solar cells; contact resistance; fill factor; glass-etching effect; high-quality contacts; homogeneous high-sheet-resistance emitter; light-induced plating; screen-printed contacts; short-circuit current density; silver plating chemistry; surface passivation; Chemistry; Contact resistance; Glass; Metals; Photovoltaic cells; Resistance; Silicon; High-efficiency solar cells; homogeneous high-sheet-resistance emitter (HHSE); ink jetted cells; silicon solar cells;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2131115