Title :
Electron mobility models for 4H, 6H, and 3C SiC [MESFETs]
Author :
Roschke, Matthias ; Schwierz, Frank
Author_Institution :
Tech. Univ. Ilmenau, Germany
fDate :
7/1/2001 12:00:00 AM
Abstract :
Models for the electron mobility in the three most important silicon carbide (SiC) polytypes, namely, 4H, 6H, and 3C SiC are developed. A large number of experimental mobility data and Monte Carlo (MC) results reported in the literature have been evaluated and serve as the basis for the model development. The proposed models describe the dependence of the electron mobility on doping concentration, temperature, and electric field. The low-field mobility in 4H SiC is much higher than in 6H and 3C in the doping range interesting for RF power transistors (1016 cm-3 ...1018 cm -3), whereas the saturation velocities in the three polytypes investigated are nearly the same (slightly above 2×107 cm/s at 300 K). The models developed can be easily incorporated into numerical device simulators
Keywords :
UHF field effect transistors; carrier mobility; microwave field effect transistors; power MESFET; semiconductor device models; semiconductor materials; silicon compounds; 300 K; MESFETs; Monte Carlo results; RF power transistors; SiC; doping concentration; electric field; electron mobility models; low-field mobility; numerical device simulators; polytypes; saturation velocities; Doping; Electron mobility; MESFETs; Monte Carlo methods; Numerical simulation; Power transistors; Radio frequency; Semiconductor process modeling; Silicon carbide; Temperature dependence;
Journal_Title :
Electron Devices, IEEE Transactions on