DocumentCode :
1505222
Title :
Frequency-dependent resistive and capacitive components in RF MOSFETs
Author :
Yuhua Cheng ; Matloubian, M.
Author_Institution :
Conexant Syst., Newport Beach, CA, USA
Volume :
22
Issue :
7
fYear :
2001
fDate :
7/1/2001 12:00:00 AM
Firstpage :
333
Lastpage :
335
Abstract :
It is found from measured high frequency (HF) S-parameter data that the extracted effective gate sheet resistance (R/sub gsh/), effective gate unit-area capacitance (C/sub gg, unit/), and transconductance (G/sub m/) in radio-frequency (RF) MOSFETs show strong frequency dependency when the device operates at frequencies higher than some critical frequency. As frequency increases, R/sub gsh/ increases but C/sub gg, unit/ and G/sub m/ decrease. This behavior is different from what we have observed at low or medium frequencies, at which these components are constant over a frequency range. This phenomenon has been observed in MOSFETs with L/sub f/ longer than 0.35 μm at frequencies higher than 1 GHz, and becomes more serious as L/sub f/ becomes longer and the frequency higher. This behavior can be explained by a MOSFET model considering the Non-Quasi-Static (NQS) effect. Simulation results show that an RF model based on BSIM3v3 with the NQS effect describes well the behaviors of both real and imaginary parts of Y/sub 21/ of the device with strong NQS effect even though its fitting to Y/sub 11/ needs to be improved further.
Keywords :
MOSFET; UHF field effect transistors; capacitance; electric resistance; semiconductor device models; 0.35 micron; 1 to 2 GHz; BSIM3v3; HF S-parameter data; MOSFET model; NQS effect; RF MOSFETs; effective gate sheet resistance; effective gate unit-area capacitance; frequency-dependent capacitive component; frequency-dependent resistive component; nonquasi-static effect; radiofrequency MOSFETs; transconductance; Capacitance; Data mining; Electrical resistance measurement; Fingers; Frequency measurement; Hafnium; MOSFETs; Radio frequency; Scattering parameters; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.930682
Filename :
930682
Link To Document :
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