Title :
Special Section on the International Symposium on Semiconductor Manufacturing
Author :
Otsuka, Nobuhiro ; Uchino, Toshiyuki
Abstract :
The ten papers in this special section were originally presented at the International Symposium on Semiconductor Manufacturing, held October 27-29, 2008, in Tokyo, Japan.
Keywords :
Copper; Etching; Lithography; Metrology; Plasma applications; Process control; Rapid thermal annealing; Semiconductor device manufacture; Semiconductor process modeling; Special issues and sections;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2009.2031745
