• DocumentCode
    1505488
  • Title

    Parallel operation of microhollow cathode discharges

  • Author

    Shi, Wenhui ; Stark, Robert H. ; Schoenbach, Karl H.

  • Author_Institution
    Phys. Electron. Res. Inst., Old Dominion Univ., Norfolk, VA, USA
  • Volume
    27
  • Issue
    1
  • fYear
    1999
  • fDate
    2/1/1999 12:00:00 AM
  • Firstpage
    16
  • Lastpage
    17
  • Abstract
    Parallel operation of DC microhollow cathode discharges in argon at pressures up to several hundred torr was obtained without individual ballast at low currents, where the slope of the current-voltage characteristic is positive. By using semi-insulating silicon as anode material, we were able to extend the range of stable operation over the entire current range, including that with negative differential resistance. This opens the possibility to utilize microhollow cathode discharge arrays in flat panel lamps
  • Keywords
    glow discharges; plasma pressure; plasma transport processes; 0 to 8 mA; 1 W; 12 W; 172 nm; 200 V; 215 to 250 V; 3 mA; 8 percent; Ar; DC microhollow cathode discharges; Si; anode material; current range; current-voltage characteristic; distributed resistive ballast; excimer lamps; flat panel lamps; microhollow cathode discharge arrays; negative differential resistance; optical power; parallel operation; semi-insulating Si; Argon; Cathodes; Electrodes; Electronic ballasts; Fault location; Glow discharges; Plasma measurements; Plasma properties; Stimulated emission; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.763000
  • Filename
    763000