Title :
Thermal plasma deposition of nanostructured films
Author :
Neuman, A. ; Blum, J. ; Tymiak, N. ; Wong, Z. ; Rao, N.P. ; Gerberich, W. ; McMurry, P.H. ; Heberlein, J.V.R. ; Girshick, S.L.
Author_Institution :
Dept. of Mech. Eng., Minnesota Univ., Minneapolis, MN, USA
fDate :
2/1/1999 12:00:00 AM
Abstract :
A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process
Keywords :
nanostructured materials; nanotechnology; plasma deposition; plasma flow; SiC; SiC films; cooled substrate; film diagnostics; hypersonic plasma particle deposition; injected precursors; nanoparticles nucleation; nanoparticles synthesis; nanostructured film; nanostructured films; nozzle; particle diagnostics; plasma flow; thermal plasma deposition; vacuum; Assembly; Electric shock; Inductors; Nanoparticles; Plasma diagnostics; Plasma measurements; Plasma sources; Plasma temperature; Substrates; Thermal expansion;
Journal_Title :
Plasma Science, IEEE Transactions on
