Title :
A self-consistent fluid simulation of an inductively coupled plasma reactor
Author :
Bose, Deepak ; Govindan, T.R. ; Meyyappan, M.
fDate :
2/1/1999 12:00:00 AM
Abstract :
We have developed a self-consistent fluid model that couples plasma dynamics, Navier-Stokes equations, and Maxwell´s equations to analyze inductively coupled plasma reactors used in semiconductor processing. Two dimensional simulations of an N2 plasma have been performed and found to agree well with experimental data. Images of plasma density, gas and ion traces are provided
Keywords :
Navier-Stokes equations; plasma density; plasma devices; plasma materials processing; plasma simulation; semiconductor technology; Maxwell´s equations; N2 plasma; Navier-Stokes equations; gas traces; inductively coupled plasma reactor; ion traces; plasma density; plasma dynamics; self-consistent fluid simulation; semiconductor processing; two dimensional simulations; Electrons; Inductors; Maxwell equations; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma simulation; Semiconductor device modeling; Semiconductor process modeling;
Journal_Title :
Plasma Science, IEEE Transactions on
