Title :
TE01 excitation of an electron cyclotron resonance plasma source
Author :
Kinder, Ron L. ; Kushner, Mark J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
fDate :
2/1/1999 12:00:00 AM
Abstract :
The uniformity of plasma generation in electron cyclotron resonance (ECR) reactors for materials processing, and the subsequent uniformity of fluxes to the substrate, are generally a function of the mode of the microwave radiation injected into the chamber. In the paper, a finite difference time domain (FDTD) simulation is used to demonstrate the consequences of exciting an ECR reactor using a TE01 mode. Due to the off axis peak in the electric field, power deposition and the plasma density peak off axis. Diffraction of the field around the resonance zone produces a secondary maximum in electron density downstream
Keywords :
cyclotron resonance; finite difference time-domain analysis; plasma density; plasma electromagnetic wave propagation; plasma materials processing; plasma production; plasma simulation; ECR reactor; TE01 excitation; TE01 mode; electric field; electron cyclotron resonance plasma source; electron cyclotron resonance reactors; electron density; field diffraction; finite difference time domain simulation; fluxes; materials processing; microwave radiation; off axis peak; plasma density; plasma generation; power deposition; resonance zone; secondary maximum; substrate; uniformity; Cyclotrons; Electrons; Finite difference methods; Inductors; Microwave generation; Plasma materials processing; Plasma simulation; Resonance; Tellurium; Time domain analysis;
Journal_Title :
Plasma Science, IEEE Transactions on
