Title :
Visualization of plasma source ion implantation for arrays of multiple targets
Author :
Keiter, E.R. ; Booske, J.H. ; Hitchon, W.N.G.
Author_Institution :
Parallel Comput. Sci., Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
Visualization of sheath overlap dynamics during plasma source ion implantation (PSII) of a multiple-target array is used to illustrate the effect of target spacing on dose uniformity over the surface of a single target. The simulations are conducted using a hybrid plasma model, and the images are created using the Tecplot package by Amtec. The simulations suggest scaling rules for sheath overlap time as a function of target spacing.
Keywords :
arrays; ion density; ion implantation; plasma density; plasma materials processing; plasma sheaths; plasma simulation; plasma-wall interactions; Amtec; Tecplot package; arrays; dose uniformity; hybrid plasma mode; images; multiple target arrays; multiple targets; plasma source ion implantation; scaling rules; sheath overlap dynamics; sheath overlap time; simulations; single target; target spacing; visualization; Electrons; Electrostatics; Ion implantation; Plasma applications; Plasma immersion ion implantation; Plasma sheaths; Plasma simulation; Plasma sources; Plasma temperature; Visualization;
Journal_Title :
Plasma Science, IEEE Transactions on
