• DocumentCode
    1505750
  • Title

    Laser-assisted bumping for flip chip assembly

  • Author

    Wang, Changhai ; Holmes, Andrew S.

  • Author_Institution
    Dept. of Comput. & Electr. Eng., Heriot-Watt Univ., Edinburgh, UK
  • Volume
    24
  • Issue
    2
  • fYear
    2001
  • fDate
    4/1/2001 12:00:00 AM
  • Firstpage
    109
  • Lastpage
    114
  • Abstract
    A novel laser-assisted chip bumping technique is presented in which bumps are fabricated on a carrier and subsequently transferred onto silicon chips by a laser-driven release process. Copper bumps with gold bonding layers and intermediate nickel barriers are fabricated on quartz wafers with pre-deposited polyimide layers, using UV lithography and electroplating. The bumps are thermosonically bonded to their respective chips and then released from the carrier by laser machining of the polyimide layer, using light incident through the carrier. Bumps of 60 to 85 μm diameter and 50 μm height at a pitch of 127 μm have been fabricated in peripheral arrays. Parallel bonding and subsequent transfer of arrays of 28 bumps onto test chips have been successfully demonstrated. Individual bump shear tests have been performed on a sample of 13 test chips, showing an average bond strength of 26 gf per bump
  • Keywords
    electroplating; flip-chip devices; laser ablation; laser beam machining; microassembling; ultraviolet lithography; 127 micron; 50 micron; 60 to 85 micron; UV lithography; bond strength; bonding layers; bump shear tests; electroplating; flip chip assembly; laser machining; laser-assisted bumping; laser-driven release process; peripheral arrays; pre-deposited polyimide layers; Assembly; Copper; Flip chip; Gold; Lithography; Nickel; Polyimides; Silicon; Testing; Wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Electronics Packaging Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-334X
  • Type

    jour

  • DOI
    10.1109/6104.930961
  • Filename
    930961