Title :
Pattern-dependent charging in plasmas
Author :
Hwang, Gyeong S. ; Giapis, Konstantinos P.
Author_Institution :
Div. of Chem. & Chem. Eng., California Inst. of Technol., Pasadena, CA, USA
fDate :
2/1/1999 12:00:00 AM
Abstract :
When patterned surfaces are exposed to plasmas, the directionality difference between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern increases (a feature multiplicity effect)
Keywords :
Monte Carlo methods; electrostatics; plasma simulation; plasma theory; plasma-wall interactions; Monte Carlo simulations; damage; differential charging; directionality; electron shading; electrons; feature multiplicity effect; ions; mixed conductor-insulator structures; pattern-dependent charging; patterned surfaces; plasmas; potential contour maps; steady-state; Electrons; Helium; Plasma accelerators; Plasma confinement; Plasma materials processing; Plasma sheaths; Plasma simulation; Plasma temperature; Surface charging; Tunneling;
Journal_Title :
Plasma Science, IEEE Transactions on
