• DocumentCode
    1505951
  • Title

    Numerical analysis of surface wave excitation in a planar-type nonmagnetized plasma processing device

  • Author

    Chen, Qing ; Aoyagi, Paul H. ; Katsurai, Makoto

  • Author_Institution
    Dept. of Electr. Eng., Tokyo Univ., Japan
  • Volume
    27
  • Issue
    1
  • fYear
    1999
  • fDate
    2/1/1999 12:00:00 AM
  • Firstpage
    164
  • Lastpage
    170
  • Abstract
    Two-dimensional numerical simulations based on the finite-difference time-domain approximation to Maxwell´s equations coupled with nonmagnetized cold electron plasma equations are used to study surface wave propagation in a four-layer planar type surface wave plasma processing structure (Komachi et al., 1994) under the assumption that the plasma is overdense. Simulations are used to verify the existence of surface waves along the plasma-dielectric window interface as well as to investigate the excitation mechanism of surface waves. In addition, simulations are used to study the effect of the air gap on the electric field distribution at the plasma-dielectric window interface. It is found that metal edges located along the processing chamber wall sufficiently close to the interface are needed to excite surface waves along the interface. It is also found that the air gap layer helps achieve a more uniform electric field distribution over the processing chamber
  • Keywords
    numerical analysis; plasma devices; plasma materials processing; plasma simulation; Maxwell equations; air gap layer; electric field distribution; excitation mechanism; finite-difference time-domain approximation; four-layer planar type surface wave plasma processing structure; interface; metal edges; nonmagnetized cold electron plasma equations; numerical analysis; overdense plasma; planar-type nonmagnetized plasma processing device; plasma simulation; plasma-dielectric window interface; processing chamber; processing chamber wall; surface wave excitation; surface waves; two-dimensional numerical simulations; uniform electric field distribution; Electrons; Finite difference methods; Maxwell equations; Numerical analysis; Numerical simulation; Plasma materials processing; Plasma simulation; Plasma waves; Surface waves; Time domain analysis;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.763108
  • Filename
    763108