DocumentCode :
1508204
Title :
The new line in IC design
Author :
Lee, Tsu-chanc ; Cong, Jason
Author_Institution :
NeoParadigm Labs. Inc., San Jose, CA, USA
Volume :
34
Issue :
3
fYear :
1997
fDate :
3/1/1997 12:00:00 AM
Firstpage :
52
Lastpage :
58
Abstract :
If deep submicron ICs are to excel in yields and performance, the design process must focus throughout on their interconnects. A new design process grapples with the problem. Design For interconnectivity, as it is called, ensures that interconnection information is available throughout the design process, so that the circuitry may be optimized around it at every stage. The availability of this information proves the key to achieving yield and performance goals in deep submicron designs. The novel process involves predicting, at an early stage in logic design, the probable paths of interconnects and any problems likely to ensue. Later on, it tackles device layout and performance verification one small step at a time. To do this, the front-end logic designers need tools to gather the proper information without plunging into the intricacies of physical design, while the back-end physical designers need tools with which to surmount interconnect issues. Moreover, technologies are required to produce globally optimized results by linking logical and physical design tools more closely
Keywords :
VLSI; circuit optimisation; integrated circuit interconnections; integrated circuit layout; logic design; IC design; back-end physical designers; deep submicron IC; design for interconnectivity; device layout; front-end logic designers; interconnects; logic design prediction; performance verification; Clocks; Delay; Design optimization; Integrated circuit interconnections; Logic design; Logic devices; Pipelines; Process design; Signal design; Timing;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/6.576009
Filename :
576009
Link To Document :
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