DocumentCode
1508427
Title
Cyclic Stabilization of Electrodeposited Nickel Structural Films
Author
Collins, James G. ; Wright, M. Clara ; Muhlstein, Christopher L.
Author_Institution
Dept. of Mater. Sci. & Eng., Pennsylvania State Univ., University Park, PA, USA
Volume
20
Issue
3
fYear
2011
fDate
6/1/2011 12:00:00 AM
Firstpage
753
Lastpage
763
Abstract
Tensile, room-temperature creep, and fatigue tests were conducted to determine the stability of the mechanical properties of electrodeposited films and to establish a unique strategy to reduce variation in micromachined devices made from them. Microcrystalline nickel films with columnar grains with a typical diameter of less than 1 μm and nanocrystalline films with 20-nm equiaxed grains were evaluated. While the tensile strengths of the films were higher than bulk forms of the material, the strength, strain to failure, and apparent elastic modulus were highly variable. Creep tests revealed that the films accumulated plastic strain rapidly at room temperature and that the apparent elastic modulus increased after exposure to stress. However, the response of the film was sensitive to the local deposition conditions. Fortunately, incremental-step fatigue tests demonstrated that the films cyclically hardened and that further changes in the elastic and plastic deformation responses do not occur after cyclic stabilization. As a result, cyclic stress strain curves and the transient stabilization behavior can be used to define a mechanical “burn-in” sequence for electrodeposited nickel films that will improve the stability and reproducibility of micromachined devices.
Keywords
creep testing; elastic deformation; elastic moduli; electrodeposits; failure (mechanical); fatigue testing; grain size; hardening; mechanical stability; metallic thin films; micromechanical devices; nanostructured materials; nickel; plastic deformation; stress-strain relations; tensile testing; yield strength; Ni; creep testing; cyclic hardening; cyclic stabilization; elastic deformation; elastic modulus; electrodeposited nickel structural films; fatigue testing; grain structures; mechanical failure; mechanical properties; microcrystalline nickel films; micromachined devices; nanocrystalline films; plastic deformation; plastic strain; size 20 nm; stress-strain curves; temperature 293 K to 298 K; tensile strength; tensile testing; yield strength; Fatigue; Loading; Materials; Nickel; Strain; Stress; Testing; Fatigue; nickel; thin films;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2011.2140354
Filename
5762307
Link To Document