Title :
MR characteristics of Ni81Fe19/Cu multilayers deposited by Kr sputtering with Ar ion bombardment on interfaces
Author :
Miyamoto, Yasuyoshi ; Watanabe, Kentaro ; Nakagawa, Shigeki ; Naoe, Masahiko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
9/1/1997 12:00:00 AM
Abstract :
Ni81Fe19/Cu multilayers with giant magnetoresistive effect were deposited by the dual ion beam sputtering method. Only two monolayers at the interfaces in Ni81Fe19/Cu multilayers deposited by Ar and/or Kr sputtering were exposed to Ar ion bombardment to change the interfacial conditions, such as sharp interface, local mixing and interfacial diffusion. The effect of ion bombardment to interfaces at restricted acceleration voltage of 160 V for the films by Ar sputtering and 140 V for the films by Kr sputtering and reduction of residual stress seems to be useful for obtaining preferable GMR characteristics, where clear interfaces and the best crystallinity seems to be attained in the multilayers
Keywords :
chemical interdiffusion; copper; giant magnetoresistance; interface structure; internal stresses; iron alloys; magnetic multilayers; nickel alloys; sputter deposition; Ar ion bombardment; Kr sputtering; Ni81Fe19-Cu; crystallinity; giant magnetoresistance; interfacial diffusion; local mixing; magnetic multilayers; residual stress; sharp interface; Acceleration; Argon; Crystallization; Giant magnetoresistance; Ion beams; Iron; Magnetic multilayers; Residual stresses; Sputtering; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
