• DocumentCode
    1508782
  • Title

    High-Uniformity Inductively Coupled Plasma Source With Magnetic Multicusp Confinement

  • Author

    Biloiu, Costel ; Olson, J.C. ; Scheuer, J.T. ; Renau, A.

  • Author_Institution
    Varian Semicond. Equip. Assoc., Gloucester, MA, USA
  • Volume
    39
  • Issue
    11
  • fYear
    2011
  • Firstpage
    2456
  • Lastpage
    2457
  • Abstract
    A high-uniformity inductively coupled plasma source is presented. The plasma uniformity is improved with a magnetic multicusp structure that surrounds the plasma chamber. A picture showing the alternating bright and dark plasma regions along the perimeter of the plasma chamber-an effect of the magnetic confinement-is presented as well.
  • Keywords
    plasma confinement; plasma sources; bright plasma region; dark plasma region; high-uniformity inductively coupled plasma source; magnetic multicusp confinement; magnetic multicusp structure; plasma chamber perimeter; Iterative closest point algorithm; Magnetic noise; Magnetic separation; Magnetic shielding; Plasma sources; Radio frequency; Inductively coupled plasma (ICP); magnetic multicusp confinement; plasma uniformity;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2130532
  • Filename
    5762361
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1508782