Title :
High-Uniformity Inductively Coupled Plasma Source With Magnetic Multicusp Confinement
Author :
Biloiu, Costel ; Olson, J.C. ; Scheuer, J.T. ; Renau, A.
Author_Institution :
Varian Semicond. Equip. Assoc., Gloucester, MA, USA
Abstract :
A high-uniformity inductively coupled plasma source is presented. The plasma uniformity is improved with a magnetic multicusp structure that surrounds the plasma chamber. A picture showing the alternating bright and dark plasma regions along the perimeter of the plasma chamber-an effect of the magnetic confinement-is presented as well.
Keywords :
plasma confinement; plasma sources; bright plasma region; dark plasma region; high-uniformity inductively coupled plasma source; magnetic multicusp confinement; magnetic multicusp structure; plasma chamber perimeter; Iterative closest point algorithm; Magnetic noise; Magnetic separation; Magnetic shielding; Plasma sources; Radio frequency; Inductively coupled plasma (ICP); magnetic multicusp confinement; plasma uniformity;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2011.2130532
