1.5 μm wavelength distributed reflector lasers with vertical grating

Author

Wiedmann, J. ; Ebihara, K. ; Kim, H.-C. ; Chen, B. ; Ohta, M. ; Matsui, K. ; Tamura, S. ; Shim, J.I. ; Arai, S.

Author_Institution

Res. Center for Quantum Effect Electron., Tokyo Inst. of Technol., Japan

Volume

37

Issue

13

fYear

2001

fDate

6/21/2001 12:00:00 AM

Firstpage

831

Lastpage

832

Abstract

A 1.5 μm wavelength distributed reflector laser, consisting of a distributed Bragg reflector rear facet and a distributed feedback region, was realised using deep-etching technology. A low threshold current of I_th=12.4 mA and a high differential quantum efficiency of η_d=42% from the front facet was achieved with a submode suppression ratio of 33 dB (I=2.4 I_th) for a fifth-order grating, 220 μm long and 6 μm wide device at room temperature

Keywords

diffraction gratings; distributed Bragg reflector lasers; distributed feedback lasers; etching; laser beams; laser feedback; laser modes; optical fabrication; semiconductor lasers; 1.5 mum; 12.4 mA; 220 mum; 298 K; 42 percent; 6 mum; deep-etching technology; distributed Bragg reflector; distributed Bragg reflector rear facet; distributed feedback region; fifth-order grating; front facet; high differential quantum efficiency; low threshold current; rear facet; room temperature; submode suppression ratio; vertical grating; wavelength distributed reflector laser; wavelength distributed reflector lasers;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:20010589

Filename

933405