• DocumentCode
    1511328
  • Title

    Off-State Degradation of High-Voltage-Tolerant nLDMOS-SCR ESD Devices

  • Author

    Griffoni, Alessio ; Chen, Shih-Hung ; Thijs, Steven ; Kaczer, Ben ; Franco, Jacopo ; Linten, Dimitri ; De Keersgieter, An ; Groeseneken, Guido

  • Author_Institution
    Interuniversity Microelectron. Center, Leuven, Belgium
  • Volume
    58
  • Issue
    7
  • fYear
    2011
  • fDate
    7/1/2011 12:00:00 AM
  • Firstpage
    2061
  • Lastpage
    2071
  • Abstract
    The OFF-state degradation of n-channel laterally diffused metal-oxide-semiconductor (MOS) silicon-controlled-rectifier electrostatic-discharge (ESD) devices for high-voltage applications in standard low-voltage complementary MOS technology is studied. Based on experimental data and technology computer-aided design simulations, impact ionization induced by conduction-band electrons tunneling from an n+ poly-Si gate to an n-well is identified to be the driving force of device degradation. Device optimization is proposed, which improves both OFF-state and ESD reliability.
  • Keywords
    MOS-controlled thyristors; MOSFET; electrostatic discharge; optimisation; semiconductor device reliability; technology CAD (electronics); tunnelling; ESD reliability; OFF-state degradation; conduction-band electron tunneling; device optimization; electrostatic discharge device; high-voltage tolerant nLDMOS-SCR ESD device; ionization impact; low-voltage complementary MOS technology; n-channel laterally diffused metal-oxide semiconductor silicon controlled rectifier device; n-well; n+ poly-Si gate; technology computer aided design simulation; Charge carrier processes; Degradation; Electrostatic discharge; Logic gates; Silicon; Stress; Thyristors; Charged device model (CDM); electrostatic discharge (ESD); human body model (HBM); input/output; laterally diffused metal–oxide–semiconductor (LDMOS); mixed signal; reliability; silicon-controlled rectifier (SCR); transmission line pulsing (TLP);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2132760
  • Filename
    5764501