• DocumentCode
    1512737
  • Title

    A 30-Gbit/s demultiplexer IC based on Si/SiGe emitter base heterojunction bipolar transistors

  • Author

    Schreiber, Hans-Ulrich ; Saxarra, M. ; Geppert, Werner

  • Author_Institution
    Ruhr-Univ., Bochum, Germany
  • Volume
    46
  • Issue
    6
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    1225
  • Lastpage
    1227
  • Abstract
    A 30-Gbit/s demultiplexer IC has been fabricated and tested using an improved double mesa Si/SiGe heterojunction bipolar transistor process. This is-to our knowledge-the highest ever reported bit rate for “real” (as opposed to drift transistor) Si/SiGe HBT circuits. The result was mainly reached by scaling down the transistor sizes to reduce parasitics. The minimum emitter mesa width was 1 μm
  • Keywords
    Ge-Si alloys; bipolar digital integrated circuits; demultiplexing equipment; elemental semiconductors; heterojunction bipolar transistors; high-speed integrated circuits; optical communication equipment; silicon; 1 mum; 30 Gbit/s; Si-SiGe; Si/SiGe HBT circuit; demultiplexer IC; double mesa emitter base heterojunction bipolar transistor; minimum emitter mesa width; parasitic reduction; transistor size scaling; Bipolar integrated circuits; Bipolar transistors; Doping; Etching; Fabrication; Germanium silicon alloys; Heterojunction bipolar transistors; Optical fiber communication; Planarization; Silicon germanium;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.766889
  • Filename
    766889