DocumentCode :
1512762
Title :
The fundamental 1/f noise and the Hooge parameter in semiconductor quantum wires
Author :
Balandin, A. ; Wang, K.L. ; Svizhenko, Alexei ; Bandyopadhyay, S.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Volume :
46
Issue :
6
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
1240
Lastpage :
1244
Abstract :
We have calculated the Hooge parameter αH characterizing fundamental 1/f noise in a free-standing intrinsic silicon quantum wire using microscopic noise theory. Our model takes into account quasi-one-dimensional confinement of both phonons and electrons. We find that at low temperatures, αH can be reduced significantly by an external magnetic field which suppresses large-angle electron scattering. This allows one to quench 1/f noise. Furthermore, a magnetic field provides a convenient tool to probe the source of noise in quantum wires, and, to a certain degree, test the validity of the microscopic mobility-fluctuation quantum noise model itself
Keywords :
1/f noise; elemental semiconductors; semiconductor quantum wires; silicon; 1/f noise; Hooge parameter; Si; electron scattering; magnetic field; microscopic mobility-fluctuation quantum noise model; quasi-one-dimensional confinement; semiconductor quantum wire; Electrons; Magnetic confinement; Magnetic fields; Magnetic noise; Microscopy; Phonons; Quantum mechanics; Semiconductor device noise; Silicon; Wire;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.766892
Filename :
766892
Link To Document :
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