DocumentCode :
1512927
Title :
Uniform High-Current Cathodes Using Massive Arrays of Si Field Emitters Individually Controlled by Vertical Si Ungated FETs—Part 2: Device Fabrication and Characterization
Author :
Velásquez-García, Luis Fernando ; Guerrera, Stephen A. ; Niu, Ying ; Akinwande, Akintunde Ibitayo
Author_Institution :
Microsyst. Technol. Labs. (MTL), Massachusetts Inst. of Technol. (MIT), Cambridge, MA, USA
Volume :
58
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
1783
Lastpage :
1791
Abstract :
We report the demonstration of electron sources that achieve high-current and uniform emission using dense arrays of Si field emitters (FEs) that are individually ballasted by a current source. Each FE is fabricated on top of a vertical ungated field-effect transistor (FET), a two-terminal device based on a very-high-aspect-ratio Si column. The ungated FET takes advantage of the velocity saturation of electrons in silicon, the high aspect ratio of the ungated FET, and the doping concentration to achieve current-source-like behavior to obtain reliable uniform and high-current electron emission. Emitted currents in excess of 0.48 A were demonstrated.
Keywords :
cathodes; electron field emission; elemental semiconductors; field effect transistors; field emitter arrays; silicon; Si; current 0.48 A; field emitters; high-current electron emission; uniform high-current cathodes; vertical ungated FET; very-high-aspect-ratio column; Current measurement; Doping; Electronic ballasts; FETs; Iron; Silicon; Voltage measurement; Ballasting; Si field emission arrays (FEAs); cathodes; electron supply control; vertical ungated Si field-effect transistors (FETs);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2128323
Filename :
5765492
Link To Document :
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