DocumentCode :
1513866
Title :
Three-dimensional self-consistent simulation of silicon quantum-dot floating-gate flash memory device
Author :
Thean, A. ; Leburton, J.P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Volume :
20
Issue :
6
fYear :
1999
fDate :
6/1/1999 12:00:00 AM
Firstpage :
286
Lastpage :
288
Abstract :
We report on the simulation of single-electron charging operation of a silicon quantum-dot memory device using the self-consistent solutions of the Schrodinger and Poisson equations. We focus on the effects of the poly-wrapped gate on the onset of inversion. We show that the geometry of the control gate causes the inversion to occur on the vertical sides of the channel. The device experiences a strongly nonuniform threshold voltage shift as a function of the number of electrons in the dot to reach about 0.5 V when the floating gate quantum-dot is charged from empty to ten electrons.
Keywords :
Poisson equation; Schrodinger equation; elemental semiconductors; flash memories; quantum well devices; semiconductor device models; semiconductor quantum dots; semiconductor storage; silicon; Poisson equation; Schrodinger equation; Si; carrier inversion; poly-wrapped gate; silicon quantum-dot floating-gate flash memory device; single-electron charging; three-dimensional self-consistent simulation; threshold voltage; Charge carrier processes; Effective mass; Electrons; Fabrication; Finite difference methods; Flash memory; Nonvolatile memory; Poisson equations; Quantum dots; Silicon on insulator technology;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.767100
Filename :
767100
Link To Document :
بازگشت