DocumentCode
1513898
Title
Comparison of reactor performance in the nonthermal plasma chemical processing of hazardous air pollutants
Author
Futamura, Shigeru ; Einaga, Hisahiro ; Zhang, Aihua
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol., Ibaraki, Japan
Volume
37
Issue
4
fYear
2001
Firstpage
978
Lastpage
985
Abstract
The performance of three different types of plasma reactors such as ferroelectric packed-bed (FPR), pulsed corona (PCR), and silent discharge (SDR) were compared in the decomposition of trichloroethylene (Cl2C=CHCl, TCE), bromomethane (CH3Br), and tetrafluoromethane (CF4). Irrespective of reactors, hazardous air pollutant (HAP) reactivity in dry N2 decreased in the order: TCE>CH3Br>CF4. Similar byproducts were obtained with any of the above reactors, and similar trends were observed in the HAP decomposition rate-retarding effect by water. Only for SDR, TCE decomposition was accelerated by O2 in the background gas. The most plausible active oxygen species is considered to be the triplet oxygen atom. In the reaction systems where chemically induced decomposition of HAPs can occur, as in the case of TCE, PCR is expected to exceed FPR and SDR in performance. In the cases of CH3 Br and CF4, residence time has been the most important factor governing their decomposition rates, and FPR and SDR have shown higher performance than PCR
Keywords
corona; decomposition; ferroelectric devices; oxygen; plasma materials processing; waste disposal; active oxygen species; bromomethane decomposition; decomposition rate; ferroelectric packed-bed reactor; hazardous air pollutants; nonthermal plasma chemical processing; pulsed corona reactor; reactor performance comparison; silent discharge reactor; tetrafluoromethane decomposition; trichloroethylene decomposition; triplet oxygen atom; Air pollution; Chemical hazards; Chemical processes; Chemical reactors; Ferroelectric materials; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties;
fLanguage
English
Journal_Title
Industry Applications, IEEE Transactions on
Publisher
ieee
ISSN
0093-9994
Type
jour
DOI
10.1109/28.936387
Filename
936387
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