DocumentCode :
1514310
Title :
A PMOS tunneling photodetector
Author :
Hsu, B.-C. ; Liu, C.W. ; Liu, W.T. ; Lin, C.-H.
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
48
Issue :
8
fYear :
2001
fDate :
8/1/2001 12:00:00 AM
Firstpage :
1747
Lastpage :
1749
Abstract :
A metal/oxide/n-Si structure with ultrathin gate oxide is utilized as a photodetector. At inversion gate bias, the dark current and photocurrent are determined by both the minority carrier (hole) generation rate in the deep depletion region and the electrons tunneling from the gate electrode to n-type Si, while only the former component is significant in the NMOS photodetector. The electron tunneling current dominates the photocurrent at sufficiently large negative gate voltage, and the sensitivity of PMOS detectors is, therefore, enhanced by approximately one order of magnitude, as compared to NMOS detectors
Keywords :
minority carriers; photodetectors; photodiodes; tunnel diodes; I-V curves; PMOS tunneling photodetector; Si; dark current; deep depletion region; electron tunneling current; enhanced sensitivity; inversion gate bias; minority carrier generation rate; photocurrent; tunneling diode; ultrathin gate oxide; Charge carrier processes; Dark current; Detectors; Electrodes; Electrons; MOS devices; Photoconductivity; Photodetectors; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.936700
Filename :
936700
Link To Document :
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