DocumentCode :
1515909
Title :
Effects of Thermal Annealing on the Dynamic Characteristics of InAs/GaAs Quantum Dot Lasers
Author :
Zhao, H.X. ; Yoon, S.F. ; Ngo, C.Y. ; Wang, R. ; Tong, C.Z. ; Liu, C.Y. ; Cao, Q.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Volume :
2
Issue :
4
fYear :
2010
Firstpage :
630
Lastpage :
635
Abstract :
We investigated the effects of rapid thermal annealing (RTA) on the dynamic characteristics of the InAs/GaAs ten-layer quantum dot (QD) laser. Improvements in the temperature stability of bandwidth have been demonstrated upon annealing. We attribute the improvements to the following factors: 1) increase in internal quantum efficiency and 2) reduction in temperature dependency of differential gain. The increase in bandwidth at high temperature from the annealed QDs could be due to a reduction in the relaxation time on the order of 0.1 ps. More importantly, the RTA process resulted in better temperature stability in the differential gain and gain compression. This is beneficial for the development of uncooled high-speed QD lasers.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; quantum dot lasers; rapid thermal annealing; InAs-GaAs; differential gain; gain compression; quantum dot lasers; rapid thermal annealing; temperature stability; uncooled high-speed QD lasers; Bandwidth; Gallium arsenide; Photonics; Quantum computing; Quantum dot lasers; Rapid thermal annealing; Semiconductor lasers; Stability; Temperature; Thermal engineering; Quantum dots (QD); semiconductor lasers;
fLanguage :
English
Journal_Title :
Photonics Journal, IEEE
Publisher :
ieee
ISSN :
1943-0655
Type :
jour
DOI :
10.1109/JPHOT.2010.2052843
Filename :
5484599
Link To Document :
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